2023-04-11 - 2023-04-14
Matthias Wissert
TRUMPF Lasersystems for Semiconductor Manufacturing
Extreme ultraviolet (EUV) lithography has become more and more important for semiconductor manufacturing over the last decade, with new semiconductor fabs for EUV lithography systems to be constructed in the coming years. This talk will focus on the source CO2 laser technology which enables EUV radiation generation from a plasma created by heating tin droplets. The TRUMPF Laser Amplifier system, which is integrated in a lithography system by ASML, will be presented with its main modules: the seed system, the amplification chain, and the beam transport system. Key parameters of the system and technological highlights will be outlined. The market status and business outlook for EUV lithography are also discussed.
